VeritySEM®

CD-SEM
CRITICAL DIMENSION

Metrex supports the full Applied Materials VeritySEM® Critical Dimension scanning electron microscope (CD-SEM) platforms used for precise pattern measurement and process control throughout semiconductor production. These systems provide sub-nanometer measurement accuracy for critical device features, helping manufacturers maintain tight process control and consistent yield in high-volume environments.
CD-SEM platforms use advanced electron optics, high-resolution beam control, and automated pattern recognition to deliver precise, repeatable metrology at production throughput. Flexible beam conditions and automated measurement routines support a wide range of structures while reducing operator intervention.
Through comprehensive service, remanufacturing, and parts support, Metrex extends the operational life and performance of CD-SEM platforms—minimizing downtime, preserving measurement capability, and maximizing long-term value across the production lifecycle.
All VeritySEM® & NanoSEM™ Platforms

OVERVIEW

Applied Materials VeritySEM® and NanoSEM platforms are CD-SEM systems used for high-resolution imaging and nanoscale analysis in semiconductor manufacturing environments.

Core Capabilities

  • High-contrast electron imaging
  • Nanoscale measurement and defect review
  • Repeatable analysis for process and materials evaluation

Applications

  • Failure analysis and diagnostics
  • Defect review and structural characterization
  • Semiconductor process monitoring

METREX SUPPORT
Metrex provides remanufacturing, installation, and long-term support for VeritySEM® and NanoSEM platforms, helping extend tool life and maintain performance in HVM environments.

WHERE APPLICABLE:
Advanced VeritySEM® Platforms (VeritySEM® 2–5)

  • Enhanced detector configurations for improved contrast
  • Automated measurement workflows
  • Expanded 3D imaging and analysis capabilities

Latest VeritySEM® Platforms (VeritySEM® 4–5)

  • Higher throughput and improved measurement stability
  • Advanced quantitative analysis features

NanoSEM® Platforms

  • Optimized for ultra-fine feature imaging
  • Specialized nanoscale characterization workflows
FEATURES
  • Optimized for Compound Semiconductor Applications
  • Advanced Packaging Compatibility
  • Flexible Wafer Handling
  • Sub-nm CD and profile metrology
  • 3D shape and sidewall analysis
  • Multi-layer pattern recognition
  • Overlay and automation for HVM fabs
  • Low-voltage, low-damage operation
  • Supported wafer sizes: (150/200/300 mm)
CHECK AVAILABILITY

PRODUCT LINEUP

All CD SEM Platform Product Lines We Support

VeraSEM™ 3D

NanoSEM™ 3D

VeritySEM®

VeritySEM®II

VeritySEM®III

VeritySEM®4i (4i+)

VeritySEM®5i

VeritySEM®6

MULTIPLE SYSTEMS IN STOCK & AVAILABLE FOR PURCHASE NOW.
PLEASE COMPLETE THE FORM BELOW.

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QUICK LINKS

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ABOUT
CONTACT

CONTACT

EMAIL: sales@gt3i.com
PHONE: 480-400-6910
PHONE: 800-608-4834
LOCATION: 15936 N 78th St
Scottsdale, AZ 85260

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